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| System Name | AlderLake |
|---|---|
| Processor | Intel i7 12700K P-Cores @ 5Ghz |
| Motherboard | Gigabyte Z690 Aorus Master |
| Cooling | Noctua NH-U12A 2 fans + Thermal Grizzly Kryonaut Extreme + 5 case fans |
| Memory | 32GB DDR5 Corsair Dominator Platinum RGB 6000MT/s CL36 |
| Video Card(s) | MSI RTX 2070 Super Gaming X Trio |
| Storage | Samsung 980 Pro 1TB + 970 Evo 500GB + 850 Pro 512GB + 860 Evo 1TB x2 |
| Display(s) | 23.8" Dell S2417DG 165Hz G-Sync 1440p |
| Case | Be quiet! Silent Base 600 - Window |
| Audio Device(s) | Panasonic SA-PMX94 / Realtek onboard + B&O speaker system / Harman Kardon Go + Play / Logitech G533 |
| Power Supply | Seasonic Focus Plus Gold 750W |
| Mouse | Logitech MX Anywhere 2 Laser wireless |
| Keyboard | RAPOO E9270P Black 5GHz wireless |
| Software | Windows 11 |
| Benchmark Scores | Cinebench R23 (Single Core) 1936 @ stock Cinebench R23 (Multi Core) 23006 @ stock |
Yesterday intel announced new names for its future manufacturing processes.
The naming should be clearer, and the smaller nodes will be defined under the Ångström unit.
Intel has also emerged as the first buyer of ASML's High-NA machines for extreme ultraviolet.
With this, ASML wants to make 3nm nodes possible. High-na is synonymous with 0.55na litho patterning, which allows fabrication of 3nm nodes using euv.
For smaller nodes, the use of euv is becoming increasingly important, with high-na the number of euv processed layers on the wafer can be increased.
This reduces the power consumption of the lithography machine and the production costs. Intel declares to be the first company to use high-na.
Intel wants to be the market leader again, instead of a follower. A presentation from ASML shows that in June of 2019 there were already three customers for the machines,
with a total of twelve systems. Intel was the first of these, but it is not known which two other companies are involved.
The naming should be clearer, and the smaller nodes will be defined under the Ångström unit.
Intel has also emerged as the first buyer of ASML's High-NA machines for extreme ultraviolet.
With this, ASML wants to make 3nm nodes possible. High-na is synonymous with 0.55na litho patterning, which allows fabrication of 3nm nodes using euv.
For smaller nodes, the use of euv is becoming increasingly important, with high-na the number of euv processed layers on the wafer can be increased.
This reduces the power consumption of the lithography machine and the production costs. Intel declares to be the first company to use high-na.
Intel wants to be the market leader again, instead of a follower. A presentation from ASML shows that in June of 2019 there were already three customers for the machines,
with a total of twelve systems. Intel was the first of these, but it is not known which two other companies are involved.