
Cadence and TSMC Advance AI and 3D-IC Chip Design with Certified Design Solutions for TSMC A16 and N2P Process
Cadence today announced it is furthering its longstanding collaboration with TSMC to accelerate time to silicon for 3D-IC and advanced-node technologies through certified design flows, silicon-proven IP and ongoing technology collaboration. As a leading provider of IP for TSMC N2P, N5 and N3 process nodes, Cadence continues to deliver cutting-edge AI-driven design solutions to the TSMC ecosystem for multiple horizontal applications from chiplets and SoCs to advanced packaging and 3D-ICs. The deep collaboration encompasses certified tools and flows for TSMC's N2P and A16 technologies, paves the way for TSMC's A14 and further unlocks 3D-IC possibilities by extending support for TSMC 3DFabric design and packaging. In addition, Cadence and TSMC are extending tool certification for newly announced TSMC N3C technology based on available N3P design solutions.
Cadence is driving innovation in AI chip design with certified tools and optimized IP for TSMC's advanced N2P and A16 process technologies. Reinforcing its memory IP leadership, Cadence offers TSMC9000 pre-silicon-certified DDR5 12.8G IP for N2P. Cadence digital, custom/analog design and thermal analysis solutions are certified for TSMC N2P and A16 technologies. Combined with continued collaboration on AI-driven digital design solutions for N2P, including leveraging large language models (LLMs), these advancements play an important role in improving digital design flows for future process nodes.
Cadence is driving innovation in AI chip design with certified tools and optimized IP for TSMC's advanced N2P and A16 process technologies. Reinforcing its memory IP leadership, Cadence offers TSMC9000 pre-silicon-certified DDR5 12.8G IP for N2P. Cadence digital, custom/analog design and thermal analysis solutions are certified for TSMC N2P and A16 technologies. Combined with continued collaboration on AI-driven digital design solutions for N2P, including leveraging large language models (LLMs), these advancements play an important role in improving digital design flows for future process nodes.