The EUV lithography machine from ASML ordered by Rapidus is expected to arrive in Japan in mid-December, according to information from Nikkei cited by TrendForce. This marks the first deployment of EUV technology in Japan, an important step for the country's semiconductor industry as it seeks to establish itself as a major player. Rapidus is currently building a factory in Chitose, Hokkaido, and plans to start mass production of 2 nm chips in 2027. The company also plans to purchase several EUV devices if the 2-nanometer chip production is successful, and intends to build a second production facility specifically for 1.4 nm chips. To support these operations, ASML will establish a service center in Chitose City.

NVIDIA CEO Jensen Huang hinted at the possibility of outsourcing AI chip production to Rapidus. As of October, construction progress on the Rapidus facility, which began in September 2023, is up to 63% and remains on track. In addition to Rapidus, Micron's Hiroshima plant is scheduled to install EUV equipment in 2025, allowing for mass production in 2026. JASM, a TSMC subsidiary in Japan, plans to integrate EUV lithography with a second wafer plant in 2027 that will have a 6 nm production line.